Russia Develops Digital Twin for Microelectronics Manufacturing

Scientists at Novosibirsk State University have created a digital twin for photolithography, a core process in microelectronics. The system is designed to improve chip quality, speed up production, and prevent equipment failures.

A new digital twin technology is now being applied in Russia’s microelectronics industry, specifically in photolithography. This method, essential for creating printed circuit boards, transfers patterns onto the surface of materials. The digital twin collects data from equipment, enables computer-based adjustments, and predicts possible breakdowns to avoid them.

With the help of a lithography model, researchers transfer an image from a photomask onto the surface of a microchip. The digital twin then simulates all stages of the process, helping optimize performance and reduce risks.

The technology was developed by scientists at Novosibirsk State University and will be tested at microelectronics enterprises in Novosibirsk and Nizhny Novgorod.